THE HEBREW UNIVERSITY CENTER FOR NANOSCIENCE AND NANOTECHNOLOGY

ALD (Atomic Layer Deposition)


​​Manufacturer and model: Ultratech, Savannah G2 S200 - Atomic Layer Deposition System
  • Substrate Size - up to 200 mm
  • Maximum Substrate Temperature - S200: RT - 350 °C
  • Deposition Uniformity - (Al2O3) <1% (1σ)
  • Options - Ozone Generator or H2O
Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1.
See how ALD works:
http://www.cambridgenanotechald.com/animations/IntroductionALD-20160920.mp4