THE HEBREW UNIVERSITY CENTER FOR NANOSCIENCE AND NANOTECHNOLOGY

Rapid Thermal Processor


Manufacturer and model: AnnealSys AS-Micro

KEY FEATURES
  • Rapid Thermal Annealing
  • Implantation annealing
  • Compound semiconductor annealing
  • Crystallization and Densification
  • Three-inch rapid thermal processor
  • Dedicated to research applications
  • Sample size: few square millimeters up to 3-inch diameter
  • Optional 3-inch susceptor for 2-inch sample
  • Quartz tube with stainless steel flanges process chamber
  • Tubular infrared halogen lamps furnace
  • Very fast ramp rates
  • Horizontal motion door with quartz tray for easy loading and unloading of the wafers and thermocouple installation
  • Temperature range: RT to 1200°C (± 1°C)
  • Ramp rate up to 250°C/s
  • Gas mixing capability with mass flow controllers: O2 and forming gas
  • Vacuum range: Atm to 10-6 Torr
  • Thermocouple temperature measurement and the fast digital PID temperature controller assure high and stable temperature control across the temperature range
  • Optional pyrometer control
  • The system is provided with full PC control with Windows compatible software
For more information:
http://www.annealsys.com/