Thin Film Reflectometry System

Manufacturer and model: Ocean Optics NanoCalc

The optical properties of thin films arise from reflection and interference. The NanoCalc Thin Film Reflectometry System allows you to analyze the thickness of optical layers from 10 nm to ~30 µm.. You can observe a single thickness with a resolution of 0.1 nm. You can analyze single-layer or multilayer films and can measure the thickness and removal rates of semiconductor process films or anti-scratch coatings, hard coatings and anti-reflection coatings.

  • Analyze single- or multi-layer films
  • Resolution to 0.1 nm
  • Ideal for in situ, on-line thickness measurements
Theory of Operation
The two most common ways to measure thin film characteristics are spectral reflectance/transmission and ellipsometry. NanoCalc utilizes the reflectance method and measures the amount of light reflected from a thin film over a range of wavelengths, with the incident light normal to the sample surface.

Search by n and k
As many as three layers can be specified in a film stack. The various films and substrate materials can be metallic, dielectric, amorphous or crystalline semiconductors. The NanoCalc Software includes a large library of n and k values for the most common materials. You can edit and add to this library. Also, you can define material types by equation or dispersion formulas.

NanoCalc Thin Film Reflectometry Systems are ideal for in situ, on-line thickness measurements and removal rate applications, and can be used to measure the thickness of oxides, SiNx, photoresist and other semiconductor process films. NanoCalc Systems measure anti-reflection coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics.

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