THE HEBREW UNIVERSITY CENTER FOR NANOSCIENCE AND NANOTECHNOLOGY

Unit for Nanofabrication - Information for Users


General Information:
The Unit for Nanofabrication (UNF), headed by Dr. Shimon Eliav, which construction was finalized in summer 2007, is in the course of extensive equipment acquisition. The unit already provides some of the state-of-the-art tools for preparing nanoscale structures and devices, which enable the connection of nanoscopic objects to the macroscopic world. A special focus is given to processing of inorganic and organic nanomaterials including biomolecules. This unit combines two complementary approaches utilized for nanofabrication:
the “Bottom-Up” approach that is inherent to nano-chemistry and the “Top-Down” approach commonly applied in modern microelectronics efforts to shrink down device dimensions.
The infrastructure of the UNF includes 300 m2 of clean rooms complete with the following instruments and facilities:
  • Lithography tools (optical and E-beam)
  • Metal deposition instruments (by sputtering and evaporation)
  • Etching facilities (wet and reactive ion etching, ion beam etching)
  • Electroplating instrument
  • Chemical vapor deposition facilities (plasma enhanced and low pressure CVDs)
  • Glove box (equipped with spin coater, vacuum oven, evaporator, etc.)
  • Packaging tools (dicing and wire bonding)
  • Characterization tools (profiler, microscopes, thickness measuring instrument, probe station, etc.)



Service Rates:
Cost for services [1] at the Unit for Nanofabrication (UNF)- Effective from 1 October 2017
HUJI Faculty & Students
Academic Institutions
Industry / Business
UNF Equipment/ Technique
Independent [2]
Technical Assist. [3]
Analysis/ Expertise
Independent [2]
Technical Assist. [3]
Analysis/ Expertise
Independent [2]
Technical Assist. [3]
Analysis/ Expertise
Clean Room
25
50
-
50
50
-
75
75
-
E-LINE System*
110
220
90
220
440
180
330
660
270
Mask Aligner
55
110
90
110
220
180
165
330
270
Miscellaneous 0 110 0 0 220 0 0 330 0
Laser Writer
55
110
90
110
220
180
165
330
270
Dicing
-
300
-
-
500
-
-
750
-
Probe Station
55
110
90
110
220
180
165
330
270
Profilometer 55 110 90 85 170 135 110 220 180
Optical Profilometer
55
110
90
110
220
180
165
330
270
Electroplating 110 220 90 220 440 180 330 660 270
Ellipsometer
55
110
90
110
220
180
165
330
270
RGA System
55
110
90
110
220
180
165
330
270
Polymers Work Bench
55
110
90
110
220
180
165
330
270
Acids Hood
55
110
90
110
220
180
165
330
270
ALD 110 220 90 220 440 180 330 660 270
Detax XT 55 110 90 85 170 135 110 220 180
Glove Box
55
110
90
110
220
180
165
330
270
RTA
55
110
90
110
220
180
165
330
270
Plasma Asher
55
110
90
110
220
180
165
330
270
Oxidation Furnaces
55
110
90
110
220
180
165
330
270
Glove Box Evaporator**
110
220
90
220
440
180
330
660
270
Evaporator**
110
220
90
220
440
180
330
660
270
Sputtering System**
110
220
90
220
440
180
330
660
270
Stripper 55 110 90 110 220 180 165 330 270
Tube Furnaces 55 110 90 110 220 180 165 330 270
Wire Bonder Ball 55 110 90 110 220 180 165 330 270
Wire Bonder Wedge 55 110 90 85 170 135 110 220 180
ICPRIE*** OXFORD
110
220
90
220
440
180
330
660
270
ICPRIE CORAL 110 220 90 220 440 180 330 660 270
PECVD***
110
220
90
220
440
180
330
660
270
Hall Effect System 55 110 90 110 220 180 165 330 270
[1] All tariffs are in NIS/hour, and don't include VAT and consumables (wafers, Au & Pd targets etc.).
[2] Independent usage of equipment will be allowed after training and approval exam by the UNF staff. Tariffs for regular work hours (9 am-5 pm).
[3] Technical assistance will be provided by the UNF scientific / technical staff only.
[4] For HUJI independent use from 5:00 p.m - 8:00 a.m- 50% discount