THE HEBREW UNIVERSITY CENTER FOR NANOSCIENCE AND NANOTECHNOLOGY

Unit for Nanofabrication - Information for Users


General Information:
The Unit for Nanofabrication (UNF), headed by Dr. Shimon Eliav, which construction was finalized in summer 2007, is in the course of extensive equipment acquisition. The unit already provides some of the state-of-the-art tools for preparing nanoscale structures and devices, which enable the connection of nanoscopic objects to the macroscopic world. A special focus is given to processing of inorganic and organic nanomaterials including biomolecules. This unit combines two complementary approaches utilized for nanofabrication:
the “Bottom-Up” approach that is inherent to nano-chemistry and the “Top-Down” approach commonly applied in modern microelectronics efforts to shrink down device dimensions.
The infrastructure of the UNF includes 300 m2 of clean rooms complete with the following instruments and facilities:
  • Lithography tools (optical and E-beam)
  • Metal deposition instruments (by sputtering and evaporation)
  • Etching facilities (wet and reactive ion etching, ion beam etching)
  • Electroplating instrument
  • Chemical vapor deposition facilities (plasma enhanced and low pressure CVDs)
  • Glove box (equipped with spin coater, vacuum oven, evaporator, etc.)
  • Packaging tools (dicing and wire bonding)
  • Characterization tools (profiler, microscopes, thickness measuring instrument, probe station, etc.)



Service Rates:
Cost for services [1] at the Unit for Nanofabrication (UNF)- Effective from 1 May 2012
HUJI Faculty & Students
Academic Institutions
Industry / Business
UNF Equipment/ Technique
Independent [2]
Technical Assist. [3]
Analysis/ Expertise
Independent [2]
Technical Assist. [3]
Analysis/ Expertise
Independent [2]
Technical Assist. [3]
Analysis/ Expertise
Clean Room
20
40
-
40
40
-
60
60
-
E-LINE System*
100
200
80
200
400
160
300
600
240
Mask Aligner
50
100
80
100
200
160
150
300
240
Miscellaneous 0 100 0 0 200 0 0 300 0
Laser Writer
50
100
80
100
200
160
150
300
240
Dicing
-
250
-
-
500
-
-
750
-
Probe Station
50
100
80
100
200
160
150
300
240
Profilometer 50 100 80 75 150 120 100 200 160
Optical Profilometer
50
100
80
100
200
160
150
300
240
Electroplating 100 200 80 200 400 160 300 600 240
Ellipsometer
50
100
80
100
200
160
150
300
240
RGA System
50
100
80
100
200
160
150
300
240
Polymers Work Bench
50
100
80
100
200
160
150
300
240
Acids Hood
50
100
80
100
200
160
150
300
240
ALD 100 200 80 200 400 160 300 600 240
Detax XT 50 100 80 75 150 120 100 200 160
Glove Box
50
100
80
100
200
160
150
300
240
RTA
50
100
80
100
200
160
150
300
240
Plasma Asher
50
100
80
100
200
160
150
300
240
Oxidation Furnaces
50
100
80
100
200
160
150
300
240
Glove Box Evaporator**
100
200
80
200
400
160
300
600
240
Evaporator**
100
200
80
200
400
160
300
600
240
Sputtering System**
100
200
80
200
400
160
300
600
240
Stripper 50 100 80 100 200 160 150 300 240
Tube Furnaces 50 100 80 100 200 160 150 300 240
Wire Bonder Ball 50 100 80 100 200 160 150 300 240
Wire Bonder Wedge 50 100 80 75 150 120 100 200 160
ICPRIE*** OXFORD
100
200
80
200
400
160
300
600
240
ICPRIE CORAL 100 200 80 200 400 160 300 600 240
PECVD***
100
200
80
200
400
160
300
600
240
Hall Effect System 50 100 80 100 200 160 150 300 240
[1] All tariffs are in NIS/hour, and don't include VAT and consumables (wafers, Au & Pd targets etc.).
[2] Independent usage of equipment will be allowed after training and approval exam by the UNF staff. Tariffs for regular work hours (9 am-5 pm).
[3] Technical assistance will be provided by the UNF scientific / technical staff only.
[4] For HUJI independent use from 5:00 p.m - 8:00 a.m- 50% discount